F 12 Factors Leading to the Formation of a Resistive Thin Film at the Bottom of Aluminum Electrolysis Cells / Marc-André Coulombe, Gervais Soucy, Loig Rivoaland, Lynne Davies // Metallurgical and Materials Transactions B. - 2016. - Vol. 47, № 2. - P1280-1295 Рубрики: ХИМИЧЕСКИЕ НАУКИ Кл.слова (ненормированные): ЭЛЕКТРОЛИЗ -- ПЛЕНКИ -- Al |